Alexander Reinhardt, CEA-LETI, France
Amelie Hagelauer, Friedrich-Alexander University, Germany
Azadeh Ansari, Georgia Institute of Technology, USA
Bernd W. Neubig, Advanced Crystal Products, USA
Cristian Cassella, Northeastern University, USA
Dan Stevens, Consultant, USA
Dr. Tory Olsson, University of Pennsylvania, USA
Jeffrey Pulskamp, US Army Research Labs, USA
Max Zeng-Hui Wang, University of Electronic Science and Technology of China, China
Randy Kubena, HRL Laboratories, USA
Reza Abdolvand, University of Central Florida, USA
Shuji Tanaka, Tohoku University, Japan
Songbin Gong, University of Illinois, USA
Tabrizian Roozbeh, University of Florida, USA
Tanay Gosavi, Intel, USA
Wei-Chang Li, National Taiwan University, Taiwan
Yoonkee Kim, US Army CERDEC, USA
Yook-Kong Yong, Rutgers University, USA
Archita Hati, National Institute of Standards and Technology, USA
Bichoy Bahr, Kilby Labs, Texas Instruments, USA
Claudio Calosso, INRiM, Italy
Craig Nelson, National Institute of Standards and Technology, USA
Enrico Rubiola, Franche-Comté Electronics Mechanics Thermal Science and Optics – Sciences and Technologies, France
Jeremy Everard, University of York, England
Magnus Danielceson, Net Insight, Sweeden
Markus Lutz, Si Time, USA
Michael Driscoll, Consultant, USA
Michael Tobar, University of Western Australia, Australia
Michael Underhill, Underhill Research Limited, UK
Olivier Llopis, Laboratoire d’Analyse et d’Architecture des Systèmes, France
Paul P. Sotiriadis, University of Athens, Greece
Sarah Bedair, US Army Research Labs, USA
Serge Galliou, Franche-Comté Electronics Mechanics Thermal Science and Optics – Sciences and Technologies, France
Wan-Thai Hsu, TXC Corporation, Taiwan
Bruno Pelle, Muquans, France
David Howe, National Institute of Standards and Technology, USA
Eric Burt, NASA Jet Propulsion Laboratory, USA
Fang Fang, National Institute of Metrology in China (NIM).
Francois-Xavier, EsnaultCNES, USA
Gaetano Mileti, Université de Neuchâtel, Switzerland
John Kitching, National Institute of Standards and Technology, USA
Liang Liu, Shanghai Institute of Optics and Fine Mechanics, China
Peter Schwindt, Sandia National Laboratories, USA
Qinghua Wang, Spectratime, France
Robert Lutwak, The Defense Advanced Research Projects Agency, USA
Robert Tjoelker, NASA Jet Propulsion Laboratory, USA
Salvatore Micalizio, INRiM, Italy
Scott Crane, U.S. Naval Research Laboratory, USA
Tom Heavener, National Institute of Standards and Technology, USA
Tom McCleland, Frequency Electornics Inc., USA
Tom Swanson, United States Naval Observatory, USA
Ashwin Seshia, University of Cambridge, UK
Bob Tingley, Draper, USA
Fabien Josse, Marquette University, US
Greg Weaver, Johns Hopkins University Applied Physics Laboratory, USA
Guillermo Villanueva, Ecole Polytechnique Federal de Lausanne, Switzerland
Hanna Cho, Ohio State University, USA
Harris Hall, Air Force Research Laboratory, USA
Laura Popa, Analog Devices, USA
Laurent Duraffourg, CEA-Leti: Laboratoire d'électronique des technologies de l'information, France
Leonhard Reindl, Uni Freiburg, Germany
Mauricio Pereira da Cunha, University of Maine, USA
Nithin Raghunathan, Purdue University, USA
Philip Feng, Case Western Reserve University, USA
Ralf Lucklum, Universität Magdeburg, Germany
Ruonan Liu, Broadcom Inc., USA
Sid Ghosh, Massachusetts Institute of Technology Lincoln Laboratories, USA
Sid TallurI, IT Mumbai, India
Sunil Bhave, Purdue University, USA
Xiyuan Lu, National Institute of Standards and Technology, USA
Zhenyun Qian, Northeastern University, USA
Clivati Cecilia, INRiM, Italy
Davide Calonico, INRiM, Italy
Daniele Rovera, OBSPM, France
Fujieda Miho, National Institute of Information and Communications Technology, Japan
Gesine Grosche, Physikalisch-Technische Bundesanstalt, Germany
Guilherme de Andrade Garcia, National Institute of Metrology Standardization and Industrial Quality, Brazil
Jay Hanssen, United States Naval Observatory, USA
Marina Gertsvolf, National Research Council, Canada
Pierre Ulrich, OBSPM, France
Prof. Dr. Daniel Varela Magalhães, University of São Paulo, Brazil
Shinn-Yan Lin (Calvin), TW, Taiwan
Stefania Romisch, National Institute of Standards and Technology, USA
Wolfgang Schaefer, Timetech, Germany
Dave Leibrandt, National Institute of Standards and Technology, USA
Marty Boyd, Vector Atomic, USA
Pierre Dubé, National Research Council Canada, Canada
Tara Fortier, National Institute of Standards and Technology, USA
Hua Guan, Wuhan Institute of Physics and Mathematics, China
David Hume, National Institute of Standards and Technology, USA
Tetsuya Ido, National Institute of Information and Communications Technology, Japan
Rodolphe Le Targat, SYRTE, France
Andrew Ludlow, National Institute of Standards and Technology, USA
Long-Sheng Ma, East China Normal University, China
John McFerran, University of West Australia, Australia
Franklyn Quinlan, National Institute of Standards and Technology, USA
Masami Yasuda, National Metrology Institute of Japan, Japan
Lin Yi, NASA Jet Propulsion Laboratory, USA
Nan Yu, NASA Jet Propulsion Laboratory, USA