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IFCS: Technical Program Committee

Alexander Reinhardt, CEA-LETI, France

Amelie Hagelauer, Friedrich-Alexander University, Germany

Azadeh Ansari, Georgia Institute of Technology, USA

Bernd W. Neubig, Advanced Crystal Products, USA

Cristian Cassella, Northeastern University, USA 

Dan Stevens, Consultant, USA

Dr. Tory Olsson, University of Pennsylvania, USA

Jeffrey Pulskamp, US Army Research Labs, USA

Max Zeng-Hui Wang, University of Electronic Science and Technology of China, China

Randy Kubena, HRL Laboratories, USA

Reza Abdolvand, University of Central Florida, USA 

Shuji Tanaka, Tohoku University, Japan

Songbin Gong, University of Illinois, USA 

Tabrizian Roozbeh, University of Florida, USA

Tanay Gosavi, Intel, USA 

Wei-Chang Li, National Taiwan University, Taiwan

Yoonkee Kim, US Army CERDEC, USA 

Yook-Kong Yong, Rutgers University, USA

Archita Hati, National Institute of Standards and Technology, USA

Bichoy Bahr, Kilby Labs, Texas Instruments, USA 

Claudio Calosso, INRiM, Italy 

Craig Nelson, National Institute of Standards and Technology, USA

Enrico Rubiola, Franche-Comté Electronics Mechanics Thermal Science and Optics – Sciences and Technologies, France

Jeremy Everard, University of York, England

Magnus Danielceson, Net Insight, Sweeden 

Markus Lutz, Si Time, USA

Michael Driscoll, Consultant, USA

Michael Tobar, University of Western Australia, Australia

Michael Underhill, Underhill Research Limited, UK

Olivier Llopis, Laboratoire d’Analyse et d’Architecture des Systèmes, France

Paul P. Sotiriadis, University of Athens, Greece

Sarah Bedair, US Army Research Labs, USA

Serge Galliou, Franche-Comté Electronics Mechanics Thermal Science and Optics – Sciences and Technologies, France

Wan-Thai Hsu, TXC Corporation, Taiwan

Bruno Pelle, Muquans, France

David Howe, National Institute of Standards and Technology, USA

Eric Burt, NASA Jet Propulsion Laboratory, USA 

Fang Fang,  National Institute of Metrology in China (NIM).

Francois-Xavier, EsnaultCNES, USA

Gaetano Mileti, Université de Neuchâtel, Switzerland

John Kitching, National Institute of Standards and Technology, USA

Liang Liu, Shanghai Institute of Optics and Fine Mechanics, China

Peter Schwindt, Sandia National Laboratories, USA

Qinghua Wang, Spectratime, France

Robert Lutwak, The Defense Advanced Research Projects Agency, USA

Robert Tjoelker, NASA Jet Propulsion Laboratory, USA 

Salvatore Micalizio, INRiM, Italy

Scott Crane, U.S. Naval Research Laboratory, USA 

Tom Heavener, National Institute of Standards and Technology, USA

Tom McCleland, Frequency Electornics Inc., USA

Tom Swanson, United States Naval Observatory, USA

Ashwin Seshia, University of Cambridge, UK

Bob Tingley, Draper, USA

Fabien Josse, Marquette University, US

Greg Weaver, Johns Hopkins University Applied Physics Laboratory, USA

Guillermo Villanueva, Ecole Polytechnique Federal de Lausanne, Switzerland

Hanna Cho, Ohio State University, USA

Harris Hall, Air Force Research Laboratory, USA

Laura Popa, Analog Devices, USA

Laurent Duraffourg, CEA-Leti: Laboratoire d'électronique des technologies de l'information, France

Leonhard Reindl, Uni Freiburg, Germany 

Mauricio Pereira da Cunha, University of Maine, USA

Nithin Raghunathan, Purdue University, USA

Philip Feng, Case Western Reserve University, USA

Ralf Lucklum, Universität Magdeburg, Germany

Ruonan Liu, Broadcom Inc., USA

Sid Ghosh, Massachusetts Institute of Technology Lincoln Laboratories, USA

Sid TallurI, IT Mumbai, India

Sunil Bhave, Purdue University, USA

Xiyuan Lu, National Institute of Standards and Technology, USA

Zhenyun Qian, Northeastern University, USA

Clivati Cecilia, INRiM, Italy

Davide Calonico, INRiM, Italy

Daniele Rovera, OBSPM, France

Fujieda Miho, National Institute of Information and Communications Technology, Japan

Gesine Grosche, Physikalisch-Technische Bundesanstalt, Germany

Guilherme de Andrade Garcia, National Institute of Metrology Standardization and Industrial Quality, Brazil

Jay Hanssen, United States Naval Observatory, USA

Marina Gertsvolf, National Research Council, Canada

Pierre Ulrich, OBSPM, France

Prof. Dr. Daniel Varela Magalhães, University of São Paulo, Brazil

Shinn-Yan Lin (Calvin), TW, Taiwan

Stefania Romisch, National Institute of Standards and Technology, USA

Wolfgang Schaefer, Timetech, Germany

Dave Leibrandt, National Institute of Standards and Technology, USA

Marty Boyd, Vector Atomic, USA

Pierre Dubé, National Research Council Canada, Canada

Tara Fortier, National Institute of Standards and Technology, USA

Hua Guan, Wuhan Institute of Physics and Mathematics, China

David Hume, National Institute of Standards and Technology, USA

Tetsuya Ido, National Institute of Information and Communications Technology, Japan

Rodolphe Le Targat, SYRTE, France

Andrew Ludlow, National Institute of Standards and Technology, USA

Long-Sheng Ma, East China Normal University, China

John McFerran, University of West Australia, Australia

Franklyn Quinlan, National Institute of Standards and Technology, USA

Masami Yasuda, National Metrology Institute of Japan, Japan

Lin Yi, NASA Jet Propulsion Laboratory, USA 

Nan Yu, NASA Jet Propulsion Laboratory, USA 

IEEE IFCS ISAF 2020 Patrons & Supporters

Special Thanks

The conference organizers gratefully acknowledge the generous support provided by the following

Conference Sponsors

IEEE
IEEE UFFC logo

Technical Sponsor

PFM

Platinum Patrons

SpectraDynamics, Inc.
TOPTICA
aixACCT Systems GmbH

Gold Patrons

Microchip Technology Incorporated
scia Systems
Radiant Technologies, Inc.
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